Analysis of SiO2 thin films deposited by PECVD using an oxygen-TEOS-argon mixture

Brazilian Journal of Physics

Volumn 31, Issue 2, 2001, Pages 299-303

  Viana, Carlos E ^a   Da Silva, Ana N R ^a   Morimoto, Nilton I ^a   Bonnaud, Olivier ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035535519     PISSN: 01039733     EISSN: None     Source Type: Journal    
DOI: 10.1590/S0103-97332001000200023     Document Type: Article

References (11)

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6. 2 PECVD", Rapid Thermal and Integrated Processing V, Mat. Res. Soc. Symp. Proceedings, vol. 429, 1996, pp. 263-268.
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