Atomic layer deposition of TiO2/Al2O3 films for optical applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5870, Issue , 2005, Pages 1-10

  Triani, Gerry ^a   Evans, Peter J ^a   Mitchell, David R G ^a   Attard, Darren J ^a   Finnie, Kim S ^a   James, Michael ^a   Hanley, Tracey ^a   Latella, Bruno ^a   Prince, Kathryn E ^a   Bartlett, John ^a  

^a AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

Alumina; Atomic layer deposition; Ellipsometry; Multi layer coatings; SIMS; TEM; Titania; XRR

Indexed keywords

ALUMINA; ELLIPSOMETRY; FILM GROWTH; MASS SPECTROMETRY; SECONDARY ION MASS SPECTROMETRY; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

ATOMIC LAYER DEPOSITION; MULTI-LAYER COATINGS; TITANIA; XRR;

THIN FILMS;

EID: 29144501201     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.638039     Document Type: Conference Paper

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