Exploring different inelastic projection mechanisms for electron tomography

Ultramicroscopy

Volumn 111, Issue 8, 2011, Pages 1262-1267

  Goris, B ^a   Bals, S ^a   Van den Broek, W ^a   Verbeeck, J ^a   Van Tendeloo, G ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

EFTEM; Electron tomography; Plasmon map; Thickness map

Indexed keywords

BEAM STABILITY; EFTEM; ELECTRON TOMOGRAPHY; ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY; HAADF-STEM; INELASTICALLY SCATTERED; LOG-RATIO METHOD; THICKNESS MAP;

ELECTRIC IMPEDANCE TOMOGRAPHY; PLASMONS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONS;

NANOTUBE;

ARTICLE; CONTROLLED STUDY; DIFFRACTION; DIFFRACTION CONTRAST; ELECTRON TOMOGRAPHY; ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY; HIGH ANGLE ANNULAR DARK FIELD SCANNING TRANSMISSION ELECTRON MICROSCOPY; IMAGE RECONSTRUCTION; INTERMETHOD COMPARISON; PLASMON TOMOGRAPHY; SCANNING TRANSMISSION ELECTRON MICROSCOPY; THICKNESS; THREE DIMENSIONAL IMAGING; TILTING; TOMOGRAPHY;

EID: 80051817675     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.02.007     Document Type: Article

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