Isoelectric points of plasma-modified and aged silicon oxynitride surfaces measured using contact angle titrations

Surface and Interface Analysis

Volumn 43, Issue 9, 2011, Pages 1257-1270

  Trevino, Kristina J ^a   Shearer, Jeffrey C ^a   McCurdy, Patrick R ^a   Pease Dodson, Shannon E ^a   Okegbe, Christabel C ^a   Fisher, Ellen R ^a  

^a Veterinary Dentistry and Oral Surgery   (United States)

Author keywords

isoelectric point; metal oxide; plasma surface modification; silicon oxynitride; XPS

Indexed keywords

ACID-BASE PROPERTY; ADHESION PROPERTIES; ADSORPTION BEHAVIOR; AGING EFFECTS; AR PLASMA TREATMENT; CHEMICAL CHANGE; CHEMICAL COMPOSITIONS; INDUCTIVELY COUPLED RF PLASMA; ISO-ELECTRIC POINTS; METAL OXIDE; METAL OXIDES; PHYSICAL STRUCTURES; PLASMA SURFACE MODIFICATION; PLASMA TREATMENT; SILICON OXYNITRIDE; SILICON OXYNITRIDES;

AMORPHOUS SILICON; CHEMICAL MODIFICATION; CONTACT ANGLE; ELECTRIC PROPERTIES; ELECTROMAGNETIC INDUCTION; GAS ADSORPTION; MATERIALS PROPERTIES; METALLIC COMPOUNDS; NITROGEN PLASMA; PH; PLASMA APPLICATIONS; PLASMA THEORY; SILICON NITRIDE; SILICON OXIDES; SURFACE TREATMENT;

SURFACE PROPERTIES;

EID: 80051663251     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3707     Document Type: Article

References (48)

1. N. Houbenov, S. Minko, M. Stamm, Macromolecules 2003, 36, 5897.
2. E. McCafferty, J. Adhes. Sci. Technol. 2002, 16, 239.
3. E. McCafferty, J. P. Wightman, J. Adhes. Sci. Technol. 1999, 13, 1415.
4. E. McCafferty, J. P. Wightman, in Apparent and Microscopic Contact Angles (Eds:, J. Drelich, J. S. Laskowski, K. L. Mittal,), VSP: Ultrecht, 2000, pp. 149.
5. F. Arefi-Khonsari, J. Kurdi, M. Tatoulian, J. Amouroux, Surf. Coat. Technol. 2001, 142, 437.
6. N. De Vietro, P. Favia, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2010, 7, 582.
7. L.-K. Chau, M. D. Porter, J. Colloid Interface Sci. 1991, 145, 283.
8. E. McCafferty, J. P. Wightman, Surf. Interface Anal. 1998, 26, 549.
9. J. M. Grace, L. J. Gerenser, J. Dispersion Sci. Technol. 2003, 24, 305.
10. E. M. Liston, L. Martinu, M. R. Wertheimer, J. Adhes. Sci. Technol. 1993, 7, 1091.
11. W. Birch, S. Mechken, A. Carre, in Surface Contamination and Cleaning (Ed:, K. L. Mittal,), VSP: New York, 2003, Vol. 1.
12. S. Debnath, R. Ranade, S. L. Wunder, G. R. Baran, J. Zhang, E. R. Fisher, J. Appl. Polym. Sci. 2005, 96, 1564.
13. K. R. Kull, M. L. Steen, E. R. Fisher, J. Membr. Sci. 2005, 246, 203.
14. M. L. Steen, W. C. Flory, N. E. Capps, E. R. Fisher, Chem. Mater. 2001, 13, 2749.
15. M. L. Steen, L. Hymas, E. D. Havey, N. E. Capps, D. G. Castner, E. R. Fisher, J. Membr. Sci. 2001, 188, 97.
16. M. L. Steen, A. C. Jordan, E. R. Fisher, J. Membr. Sci. 2002, 204, 341.
17. J. Zhou, E. R. Fisher, J. Nanosci. Nanotechnol. 2004, 4, 539.
18. U. Lappan, M. Nitschke, D. Pleul, F. Simon, S. Uhlmann, Plasmas Polym. 2001, 6, 211.
19. L. Tusek, M. Nitschke, C. Werner, K. Stana-Kleinschek, V. Ribitsch, Colloids Surf. A 2001, 195, 81.
20. T. R. Gengenbach, Z. R. Vasic, R. C. Chatelier, H. J. Griesser, J. Polym. Sci. A: Polym. Chem. 1994, 32, 1399.
21. M.-G. Barthes-Labrousse, Vacuum 2002, 67, 385.
22. C. Canal, R. Molina, E. Bertran, P. Erra, J. Adhes. Sci. Technol. 2004, 18, 1077.
23. P. Favia, N. De Vietro, R. Di Mundo, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2006, 3, 66.
24. I. T. Martin, B. Dressen, M. Boggs, Y.-J. Liu, C. S. Henry, E. R. Fisher, Plasma Process. Polym. 2007, 4, 412.
25. N. M. Mackie, N. F. Dalleska, D. G. Castner, E. R. Fisher, Chem. Mater. 1997, 9, 349.
26. J. C. Shearer, M. J. Fisher, D. Hoogeland, E. R. Fisher, Appl. Surf. Sci. 2010, 256, 2081.
27. K. J. Trevino, E. R. Fisher, Plasma Process. Polym. 2009, 6, 180.
28. G. S. Malkov, E. R. Fisher, Plasma. Process. Polym. 2010, 7, 695.
29. G. M. Ingo, C. Riccucci, G. Bultrini, G. Chiozzini, J. Thermal Anal. Calorim. 2001, 66, 27.
30. M. F. Koenig, J. T. Grant, J. Electron Spectrosc. Rel. Phenom. 1984, 33, 9.
31. P. Cova, S. Poulin, R. A. Masut, J. Appl. Phys. 2005, 98, 094903.
32. P. Cova, S. Poulin, O. Grenier, R. A. Masut, J. Appl. Phys. 2005, 97, 073518.
33. M. R. Alexander, R. D. Short, F. R. Jones, W. Michaeli, C. J. Blomfield, Appl. Surf. Sci. 1999, 137, 179.
34. D. Chvedov, E. L. B. Logan, Colloids Surfaces A 2004, 240, 211.
35. E. McCafferty, J. P. Wightman, J. Colloid Interface Sci. 1997, 194, 344.
36. C. Vittoz, M. Mantel, J. C. Joud, J. Adhes. 1998, 67, 347.
37. W. Kern, D. A. Puotinen, RCA Rev. 1970, 31, 187.
38. V. Godinho, M. C. Jimenez de Haro, J. Garcia-Lopez, V. Goossens, H. Terryn, M. P. Delplancke-Ogletree, A. Fernandez, Appl. Surf. Sci. 2010, 256, 4548.
39. G. A. Parks, Chem. Rev. 1964, 65, 177.
40. R. M. Torres-Sanchez, A. B. Garcia, A. M. Cesio, J. Euro. Ceram. Soc. 1996, 16, 1127.
41. D. E. Jan, S. Raghavan, J. Electrochem. Soc. 1994, 141, 2465.
42. J. Zhang, F. Ye, D. Jiang, M. Iwasa, Coll. Surf. A 2005, 259, 117.
43. J. Chastain, R. C. King, Jr., Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data, Physical Electronics, Inc.: Eden Praire, MN, 1995, pp. 261.
44. C. R. Eddy, Jr., B. Molnar, J. Electron. Mater. 1999, 28, 314.
45. N. M. Mackie, D. G. Castner, E. R. Fisher, Langmuir 1998, 14, 1227.
46. D. J. V. Pulsipher, E. R. Fisher, Surf. Coat. Technol. 2009, 203, 2236.
47. G. W. Simmons, B. C. Beard, J. Phys. Chem. 1987, 91, 1143.
48. T. Wakida, K. Takeda, I. Tanaka, T. Takagishi, Textile Res. J. 1989, 59, 49.