Determination of the surface isoelectric point of oxide films on metals by contact angle titration

Journal of Colloid and Interface Science

Volumn 194, Issue 2, 1997, Pages 344-355

  McCafferty, E ^a,b   Wightman, J P ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

Carbon overlayer; Contact angle; Metals; Oxide films; Surface isoelectric point; Wilhelmy balance; XPS

Indexed keywords

METAL; OXIDE;

ARTICLE; CONTACT ANGLE; ISOELECTRIC POINT; PH; PRIORITY JOURNAL; SURFACE PROPERTY; THICKNESS; TITRIMETRY;

EID: 0031572816     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1997.5138     Document Type: Article

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