Acid/base gas/Liquid adsorption properties of Carbon Black modified in NH3/O2 RF glow discharges

Plasma Processes and Polymers

Volumn 7, Issue 7, 2010, Pages 582-587

  De Vietro, Nicoletta ^a   Favia, Pietro ^a,b   Fracassi, Francesco ^a,b   D'Agostino, Riccardo ^a,b  

^a UNIVERSITY OF BARI   (Italy)

^b CNR   (Italy)

Author keywords

Acid base surface properties; Boehm titrations; Carbon black; Gas vapour adsorption; Morphology; Plasma treatment; Radiation

Indexed keywords

ADSORPTION PROPERTIES; ADSORPTION TESTS; BASIC COMPOUNDS; BOEHM TITRATION; BOEHM TITRATIONS; CHEMICAL GROUP; GAS/VAPOUR ADSORPTION; MODIFIED CARBON; PLASMA REACTORS; PLASMA TREATMENT; RF GLOW DISCHARGE; SURFACE CHEMICAL COMPOSITION; WATER SOLUTIONS;

ACIDS; CARBON BLACK; GLOW DISCHARGES; HYDROCHLORIC ACID; MORPHOLOGY; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMAS; SURFACE PROPERTIES; TRACE ANALYSIS;

GAS ADSORPTION;

EID: 77954931503     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900149     Document Type: Article

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