Nanoimprint lithography resist profile inversion for lift-off applications

Microelectronic Engineering

Volumn 88, Issue 9, 2011, Pages 3011-3014

  Shields, Philip A ^a   Allsopp, Duncan W E ^a  

^a University of Bath   (United Kingdom)

Author keywords

HSQ; Lift off; Nanoimprint lithography; Re entrant; Spin on glass

Indexed keywords

HSQ; LIFT-OFF; NANO-IMPRINT; RE-ENTRANT; SPIN ON GLASS;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; SPIN GLASS;

NANOIMPRINT LITHOGRAPHY;

EID: 80051549079     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.04.063     Document Type: Article

References (11)

1. S.Y. Chou, P.R. Krauss, W. Zhang, L. Guo, and L. Zhuang Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 15 6 1997 2897 2904
2. M.D. Austin, H.X. Ge, W. Wu, M.T. Li, Z.N. Yu, D. Wasserman, S.A. Lyon, and S.Y. Chou Applied Physics Letters 84 26 2004 5299 5301
3. L.J. Guo Journal of Physics D: Applied Physics 37 11 2004 R123
4. T. Balla, S.M. Spearing, and A. Monk Journal of Physics D-Applied Physics 41 17 2008
5. H. Tan, A. Gilbertson, S.Y. Chou, In Roller nanoimprint lithography, Papers from the 42nd international conference on electron, ion, and photon beam technology and nanofabrication, Chicago, AVS: Chicago, Illinois (USA), 1998, pp. 3926-3928.
6. S.H. Lan, H.J. Lee, J. Ni, S. Lee, M. Lee, Survey on Roller-type Nanoimprint Lithography (RNIL) process, 2008 International Conference on Smart Manufacturing Application (2008) 371-376.
7. G. Hubbard, S.J. Abbott, Q. Chen, D.W.E. Allsopp, W.N. Wang, C.R. Bowen, R. Stevens, A. Satka, D. Hasko, F. Uherek, and J. Kovác Physica E: Low-dimensional Systems and Nanostructures 41 6 2009 1118 1121
8. P. Carlberg, M. Graczyk, E.L. Sarwe, I. Maximov, M. Beck, and L. Montelius Microelectronic Engineering 67 8 2003 203 207
9. K. Nakamatsu, K. Tone, and S. Matsui Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications and Review Papers 44 11 2005 8186 8188
10. J. Tao, Y. Chen, X. Zhao, A. Malik, and Z. Cui Microelectronic Engineering 78 79 2005 665 669
11. R.H. Baney, M. Itoh, A. Sakakibara, and T. Suzuki Chemical Reviews 95 5 1995 1409 1430