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Volumn 519, Issue 20, 2011, Pages 6955-6959

The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton

Author keywords

Hole diameter; Hollow cathode; Multi hole electrode; Plasma density

Indexed keywords

ELECTRODE HOLES; GAS PLASMA; HIGH DENSITY; HOLE DIAMETER; HOLLOW CATHODES; MULTI-HOLE ELECTRODE; RF CAPACITIVELY COUPLED PLASMA;

EID: 80051546722     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.139     Document Type: Conference Paper
Times cited : (20)

References (14)
  • 11
    • 41749100584 scopus 로고    scopus 로고
    • Optimization of the high rate microcrystalline silicon deposition conditions of the multi-hole-cathode very high frequency SiH4/H2 plasma, Waikoloa, HI, USA, May 7 12, 2006
    • A.H.M. Smets, T. Matsui, and M. Kondo Optimization of the high rate microcrystalline silicon deposition conditions of the multi-hole-cathode very high frequency SiH4/H2 plasma, Waikoloa, HI, USA, May 7 12, 2006 Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on, 2, 1592 2006 http://ieeexplore.ieee.org/Xplore/login.jsp?url= http%3A%2F%2Fieeexplore.ieee.org%2Fiel5%2F4059527%2F4059868%2F04059956. pdf%3Farnumber%3D4059956&authDecision=-203
    • (2006) Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference On, 2, 1592
    • Smets, A.H.M.1    Matsui, T.2    Kondo, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.