Optimization of the high rate microcrystalline silicon deposition conditions of the multi-hole-cathode very high frequency SiH4/H 2 plasma

Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

Volumn 2, Issue , 2006, Pages 1592-1595

  Smets, Arno H M ^a   Matsui, Takuya ^a   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; DEPOSITION RATES; GRAIN BOUNDARIES; OPTIMIZATION; PLASMA DEPOSITION; PLASMAS; SILICON COMPOUNDS;

MICROSTRUCTURAL PROPERTIES;

MICROCRYSTALLINE SILICON;

EID: 41749100584     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WCPEC.2006.279790     Document Type: Conference Paper

References (9)

1. T. Matsui, A. Matsuda, and M. Kondo, Mat. Res. Soc. Proc. Symp. Proc. Vol. 808, 2004, pp. A8.1.1.
2. A.H.M. Smets and M. Kondo, to be published in J. Non-Cryst. Solds, may 2006.
3. S. Nunomura, M. Kondo, and H. Akatsuka, (to be published).
4. N. Itabashi, N. Nishiwaki, M. Magane, S. Naito, T. Goto, A. Matsuda, C. Yamada, and E. Hirota, Jpn. J. Appl. Phys. 29, 2005, pp. L505.
5. T. Nagai, A.H.M. Smets, and M. Kondo, to be published in Jpn. J. Appl. Phys,august 2006.
6. C. Niikura, M. Kondo, and A. Matsuda, J. Non-Cryst. Solids 338-340, 2004, pp. 42.
7. C. Niikura, N. Itagaki, M. Kondo, Y. Kawai, and A. Matsuda, Thin Solid Films 457, 2004, pp. 84.
8. T. Matsui, M. Kondo, and A. Matsuda, Jpn. J. Appl. Phys. Vol. 42, 2003, pp. L901.
9. A.H.M. Smets, W.M.M. Kessels, and M.C.M. van de Sanden, Appl. Phys. Lett. 82, 2003, pp. 1547.