Recent advancements in EUV resist materials and process performance

Journal of Photopolymer Science and Technology

Volumn 24, Issue 1, 2011, Pages 25-32

  Goethals, Anne Marie ^a   Niroomand, Ardavan ^a   Van Roey, Frieda ^a   Hosokawa, Kohei ^a   Pollentier, Ivan ^a  

^a IMEC   (Belgium)

Author keywords

EUV lithography; EUV resists; LER; Pattern collapse; Rinse; TBAH

Indexed keywords

EID: 79961121559     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.24.25     Document Type: Article

References (17)

1. Chawon Koh, Jacque Georger, Liping Ren, George Huang, Frank Goodwin, Stefan Wurm, Dominic Ashworth, Warren Montgomery, Bill Pierson, Joo-on Park, and Patrick Naulleau, Proc. of SPIE Vol. 7636 (2010),763604.
2. Hyun-Woo Kim, Hai-Sub Na, Kyoung-Yong Cho, Chang-Min Park, Takahiro Yasue, Subramanya Mayya, and Han-Ku Cho, Proc. of SPIE Vol. 7636 (2010), 76360Q.
3. Kentara Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Gousuke Shiraishi, Kazuyki Matsunaro, Julius Joseph Santillan, and Toshiro Itani, J. Photopolym. Sci. Technol., vol. 23, N0 5 (2010), 613-618.
4. E. Steve Putna, Todd R. Younkin, Roman Caudillo, and Manish Chandhok, Proc. of SPIE Vol. 7636 (2010), 76360P.
5. Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, and Kurt Ronse, J. Photopolym. Sci. Technol., vol. 20, N0 3 (2007), 383-392.
6. G. F. Lorusso, J. Hermans, A. M. Goethals, B. Baudemprez, F. Van Roey, A. M. Myers, I. Kim, B.S. Kim, R. Jonckheere,A. Niroomand, S. Lok, A. Van Dijk, J.F. de Marneffe, S. Demuynck, D. Goossens and K. Ronse, Proc. SPIE 6921 (2008), 692100.
7. Philippe Foubert, Alessandro Vaglio Pret, Efrain Altamirano Sanchez, Roel Gronheid, Proc. SPIE 7972 (2011), 797213.
8. Christian Wagner, Noreen Harned, Eric Loopstra, et al. Proc. SPIE 7969 (2011), 79691F.
9. I. Pollentier, J. Photopolym. Sci. Technol., vol. 23, N0 5 (2010), 605-612.
10. I. Pollentier, G. Aksenov, A.-M. Goethals, R. Gronheid, R. Jonckheere, and M. Leeson, Proc. SPIE 7271 (2009), pp. 727146.
11. A.M. Goethals, A. Niroomand, K. Ban, K. Hosokawa, F. Van Roey, O. Pollentier, D. Van den Heuvel, K. Ronse, 2010 EUVL symposium, October 17-20, 2010, Kobe, Japan.
12. Alessandro Vaglio Pret, Roel Gronheid, Trey Graves, Mark D. Smith, John Biafore, Proc. SPIE 7969 (2011), 79691T.
13. R. Gronheid, T. Younkin, M. Leeson, C. Fonseca, J. Hooge, K. Nafus, J. Biafore, M. Smith, Proc. SPIE 7969 (2011), 796904.
14. Itani, T.; Oizumi, H.; Kaneyama, K.; Kawamura, D.; Kobayashi, S.; Santillan, J. J. J. Photopolym. Sci. Technol. 22(1), (2009), 59-64.
15. Matsunaga, K.; Oizumi, H.; Kaneyama, K.; Shiraishi, G.; Matsumaro, K.; Santillian, J. J.; Itani, T. 2009 International Symposium on Extreme Ultraviolet Lithography, October 19-21, Prague, Czech Republic.
16. R. Gronheid, J. Vac. Sci. Technol. B 28(6), Nov/Dec 2010.
17. Karen Petrillo, George Huang, Dominic Ashworth, Jacque Georger, Liping Ren, KY Cho, Warren Montgomery, Stefan Wurm, Shinichiro Kawakami, Shannon Dunn, Akiteru Ko, Proc. SPIE 7969 (2011), 796913.