Pattern formation on polymer resist by solvent-assisted nanoimprinting with PDMS mold as a solvent transport medium

Journal of Micromechanics and Microengineering

Volumn 21, Issue 7, 2011, Pages

  Lai, K L ^a   Hon, M H ^a   Leu, I C ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL CONTACTS; CURVED SURFACES; EXTERNAL LOADING; HIERARCHICAL STRUCTURES; IMPRINTING LITHOGRAPHY; LARGE-AREA PATTERNING; NANO PATTERN; NANO-IMPRINTING; PATTERN FORMATION; PDMS MOLDS; POLYDIMETHYLSILOXANE MEMBRANE; POLYMER RESIST; SOLVENT TRANSPORT; SOLVENT VAPOR PRESSURE; TRANSPORT MECHANISM;

MICROCHANNELS; MOLDING; MOLDS; POLYSTYRENES; SILICONES; TWO DIMENSIONAL; VAPORS;

SOLVENTS;

EID: 79960058291     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/7/075013     Document Type: Article

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