Study on critical dimension of printable phase defects using an EUV microscope

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 505-508

  Kinoshita, H ^a,c   Yoshizumi, T ^a,c   Osugi, M ^a,c   Kishimoto, J ^a,c   Sugiyama, T ^b   Uno, T ^b   Watanabe, T ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Defect; EUV lithography; EUV microscope; Mask

Indexed keywords

ACTINIC MASK INSPECTIONS; CRITICAL DIMENSIONS; DEEP PITS; EUV LITHOGRAPHY; EUV MICROSCOPE; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; EXTREME ULTRAVIOLET MICROSCOPIES; GLASS SUBSTRATES; PHASE DEFECTS; SCHWARZSCHILD OPTICS; X-RAY ZOOMING TUBES;

ACTINIDES; DEFECTS; GLASS; INSPECTION; LASER PULSES; MICROSCOPES; SUBSTRATES; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67349115982     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.006     Document Type: Article

References (9)

1. International Technology Roadmap for Semiconductors, 2005 Edition.
2. Haga T., Takenaka H., and Fukuda M. J. Vac. Sci. Technol. B 18 (2000) 2916
3. Haga T., Kinoshita H., Hamamoto K., Takada S., Kazui N., Kakunai S., Tsubakino H., and Watanabe T. Jpn. J. Appl. Phys. 42 (2003) 3771
4. Kinoshita H., Haga T., Hamamoto K., Takada S., Kazui N., Kakunai S., Tsubakino H., Shoki T., Endo M., and Watanabe T. J. Vac. Sci. Technol. B 22 (2004) 264
5. Hamamoto K., Tanaka Y., Kawashima H., Lee S.Y., Hosokawa N., Sakaya N., Hosoya M., Shoki T., Watanabe T., and Kinoshita H. Jpn. J. Appl. Phys. 44 (2005) 5474
6. Hamamoto K., Tanaka Y., Lee S.Y., Hosokawa N., Sakaya N., Hosoya M., Shoki T., Watanabe T., and Kinoshita H. J. Vac. Sci. Technol. B 23 (2005) 2852
7. Hamamoto K., Tanaka Y., Yoshizumi T., Hosokawa N., Sakaya N., Hosoya M., Shoki T., Watanabe T., and Kinoshita H. Jpn. J. Appl. Phys. 45 (2006) 5378
8. H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, S. Wurm, Proc. SPIE 6517 (2007) 65170B-1-10.
9. Han H., Cho W., Goldberg K.A., Gulikson E.M., Jeon C.-U., and Wulm S. Proc. SPIE 6921 (2008) 62911Y