SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2192-2195

Fabrication of flexible mold for hybrid nanoimprint-soft lithography

(3) Zhang, Jian a Cui, Bo a Ge, Haixiong b

a UNIVERSITY OF WATERLOO (Canada)

b NANJING UNIVERSITY (China)

Author keywords

Electron beam lithography; Hybrid nanoimprint soft lithography; PMGI; Sacrificial mold

Indexed keywords

BASIC SOLUTIONS; DIRECT WRITING; E-BEAM LITHOGRAPHY; HYBRID NANOIMPRINT-SOFT LITHOGRAPHY; LITHOGRAPHY PROCESS; PATTERN REPLICATION; PMGI; POLYDIMETHYLSILOXANE PDMS; POLYMER LAYERS; SACRIFICIAL MOLD; UV CURABLE;

CURING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MICROCHANNELS; MOLDS;

NANOIMPRINT LITHOGRAPHY;

EID: 79960031188 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.12.107 Document Type: Conference Paper

Times cited : (8)

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