Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering

Surface and Coatings Technology

Volumn 150, Issue 1, 2002, Pages 88-94

  Bartzsch, H ^a   Frach, P ^a   Goedicke, K ^a   Bocher B ^a   Gottfried, Chr ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Alumina; Magnetron sputtering; Pulse sputtering; Reactive sputtering

Indexed keywords

DEPOSITION; EROSION; HYSTERESIS; INERT GASES; MAGNETIC FIELDS;

TARGET EROSION;

MAGNETRON SPUTTERING;

STABILITY;

EID: 0036470723     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01507-9     Document Type: Article

References (7)