Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  He, Yuan ^a   Byers, Erik ^a   Light, Scott ^a   Hines, Danielle ^a   Devilliers, Anton ^a   Hyatt, Mike ^a   Zhou, Jianming ^a   Nair, Vinay ^a   Yu, Zongchang ^b   Cao, Yu ^b   Xie, Xu ^b   Shao, Wenjin ^b   Aldana, Rafael ^b   Goossens, Ronald ^b   Ma, Chang Qun ^b   Lu, Junwei ^b   Liu, Hua Yu ^b   Aquino, Chris ^b   Engblom, Peter ^b   Nooitgedagt, Tjitte ^b   Janda, Eric ^b   more..

^a MICRON TECHNOLOGY INC   (United States)

^b ASML US Inc   (United States)

Author keywords

full chip contour based scanner optimization; optical model based; scanner matching; scanner simulation

Indexed keywords

PATTERN MATCHING; UNITS OF MEASUREMENT;

ARF IMMERSIONS; CD MEASUREMENTS; FULL CHIPS; LARGE AMOUNTS; OPTICAL MODELING; SCANNER MATCHING; SCANNER SIMULATIONS; TECHNOLOGY NODES;

SCANNING;

EID: 84905513815     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848255     Document Type: Conference Paper

References (7)

1. L. Van Look et al., "Tool-to-tool optical proximity effect matching," Proc. SPIE, Vol.6924 (2008)
2. Y. He et al., "Process Transfer Strategies between ASML Immersion Scanners", Proc. of SPIE Vol. 7274 (2009)
3. C.Y. Shih et al., "Model-based scanner tuning in a manufacturing environment", Proc. of SPIE Vol. 7274 (2009)
4. Z. Yu et al., "Production-worthy Full Chip Image-based Verification" BACUS conference, February 2009
5. Y. Zhang, et.al, "A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction," Proc. SPIE Vol. 6283 (2006).
6. T. Heil et al., "Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications," Proc. SPIE Vol. 5377 (2004).
7. D. Flagello et al., "Understanding illumination effects for control of optical proximity effects (OPE)," Proc. SPIE Vol. 6924, 69241U (2008)