Printing the metal and contact layers for the 32- and 22-nm node: Comparing positive and negative tone development process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Van Look, L ^a   Bekaert, J ^a   Truffert, V ^a   Wiaux, V ^a   Lazzarino, F ^a   Maenhoudt, M ^a   Vandenberghe, G ^a   Reybrouck, Mario ^b   Tarutani, Shinji ^c  

^a IMEC   (Belgium)

^b FUJIFILM Electronic Materials EU   (Belgium)

^c FUJIFILM CORPORATION   (Japan)

Author keywords

ArF lithography extendibility; contact layer; double exposure; image reversal; metal layer; negative tone development; resolution enhancement

Indexed keywords

NANOTECHNOLOGY; PRINTING;

ARF LITHOGRAPHY; CONTACT LAYERS; DOUBLE EXPOSURE; IMAGE REVERSAL; METAL LAYER; NEGATIVE TONE DEVELOPMENT; RESOLUTION ENHANCEMENT;

LITHOGRAPHY;

EID: 77953251058     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848228     Document Type: Conference Paper

References (6)

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3. Truffert, V., Bekaert, J., Lazzarino, F., Maenhoudt, M., Miller, A., Moelants, M., Wu, T., "Ultimate contact hole resolution using immersion lithography with line/space imaging," Proc. SPIE 7274, 72740N (2009).
4. Brunner, T. A., Fonseca, C., "Optimum tone for various feature types: positive versus negative," Proc. SPIE 4345, p. 30-36 (2001).
5. Bekaert, J., Laenens, B., Verhaegen, S., Van Look, L., Trivkovic, D., Lazzarino, F., Vandenberghe, G., van Adrichem, P., Socha, R., Baron, S., Tsai, M. C., Ning, K., Hsu, S., Liu, H. Y., Mulder, M., Bouma, A., van der Heijden, E., Mouraille, O., Schreel, K., Finders, J., Dusa, M., Zimmermann, J., Gräupner, P., Neumann, J. T., Hennerkes, C., "Freeform illumination sources: An experimental study of source-mask optimization for 22 nm SRAM cells", Proc. SPIE 7640, 7640-7 (2010).
6. Hendrickx, E., Tritchkov, A., Sakajiri, K., Granik, Y., Kempsell, M., Vandenberghe, G., "Hyper-NA imaging of 45nm node random CH layouts using inverse lithography," Proc. SPIE 6924, 69240L (2008).