New Critical Dimension Uniformity measurement concept based Reticle Inspection Tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Seo, KangJoon ^a   Kim, MunSik ^c   Kim, Sang Chul ^c   Shin, JaeCheon ^c   Kim, ChangYeol ^c   Miller, John ^b   Dayal, Aditya ^c   Hutchinson, Trent ^c   Park, KiHun ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b KLA TENCOR CORPORATION   (United States)

^c Junghak Bldg ^*

Author keywords

CD SEM; CDU map; Critical dimension uniformity (CDU); Reticle inspection based

Indexed keywords

45-NM HALF-PITCH; ACTIVE MECHANISM; ATTENUATED PHASE SHIFT MASKS; BASIC THEORY; CD UNIFORMITY; CD-SEM; CDS; CONCEPT-BASED; CRITICAL DIMENSION UNIFORMITIES; CURRENT VARIABILITY; DATA COLLECTION; HIGH NA; HIGH THROUGHPUT; INDUSTRY STANDARDS; MASK MAKERS; MASK MANUFACTURING; MASK WRITER; NONUNIFORMITY; OPTICAL MASK; RETICLE INSPECTION; ROADMAP; SEM; TYPICAL APPLICATION; WAFER FAB; WAFER PRODUCTION;

DATA ACQUISITION; DATA STORAGE EQUIPMENT; INSPECTION; INSPECTION EQUIPMENT; LITHOGRAPHY; MACHINE TOOLS; PHOTOMASKS; SPECIFICATIONS;

OPTICAL INSTRUMENTS;

EID: 77954400150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864109     Document Type: Conference Paper

References (2)

1. Wylie, M. et al. "Critical dimension uniformity using reticle inspection tool", Proc. SPIE 7488, (2009).
2. Vellanki et al. "Reticle inspection-based critical dimension uniformity", Proc. SPIE 7379, (2009).