Lithography simulation in DfM - Achievable accuracy versus requirements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Mansfield, Scott ^a   Graur, Ioana ^a   Han, Geng ^a   Meiring, Jason ^a   Liebmann, Lars ^a   Chidambarrao, Dureseti ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Closed loop DfM; Compact models; Dense simulation; Design for manufacturability (DfM); Optical proximity correction (OPC); Process window; Resolution enhancement techniques (RET); Through process models

Indexed keywords

COMPACT MODELS; DENSE SIMULATION; DESIGN FOR MANUFACTURABILITY (DFM); OPTICAL PROXIMITY CORRECTION (OPC); PROCESS WINDOW; RESOLUTION ENHANCEMENT TECHNIQUES (RET);

COMPUTER SIMULATION; DATA PRIVACY; ERROR ANALYSIS; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER;

PHOTOLITHOGRAPHY;

EID: 35148848213     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712437     Document Type: Conference Paper

References (12)

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