Methodology for accurate and rapid simulation of large arbitrary 2D layouts of advanced photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 1051-1067

  Adam, Konstantinos ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Diffraction order; Domain decomposition method; Edge diffraction; Phase shift mask modeling

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ERROR ANALYSIS; IMAGING SYSTEMS; LIGHT PROPAGATION; LIGHT SCATTERING;

PHOTOMASKS;

MASKS;

EID: 0035767785     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458269     Document Type: Conference Paper

References (10)

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