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Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 474, Issue 3, 2001, Pages 259-272

Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

(12) Dattoli, Guiseppe a Doria, Andrea a Gallerano, Gian Piero a Giannessi, Luca a Hesch, Klaus b Moser, Herbert O c Ottaviani, Pier Luigi a Pellegrin, Eric b Rossmanith, Robert b Steininger, Ralph b Saile, Volker b Wüst, Jürgen b

a ENEA (Italy)

b KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

c NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

Lithography; Radiation by moving charges; Synchrotron radiation

Indexed keywords

EXTREME ULTRAVIOLET (EUV) SOURCES;

BANDWIDTH; FREE ELECTRON LASERS; LIGHT EMISSION; LINEAR ACCELERATORS; LITHOGRAPHY; SUPERCONDUCTING MAGNETS; ULTRAVIOLET DEVICES;

SYNCHROTRON RADIATION;

EID: 0035846518 PISSN: 01689002 EISSN: None Source Type: Journal
DOI: 10.1016/S0168-9002(01)00887-7 Document Type: Article

Times cited : (26)

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