Tin based laser-produced plasma source development for EUVL

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 699-702

  Hayden, P ^a   White, J ^a   Cummings, A ^a   Dunne, P ^a   Lysaght, M ^a   Murphy, N ^a   Sheridan, P ^a   O'Sullivan, G ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

Calculated spectra; Conversion efficiency; Extreme ultraviolet lithography; Laser produced plasma

Indexed keywords

BANDWIDTH; CRYSTAL ATOMIC STRUCTURE; LASER PULSES; PHASE TRANSITIONS; PLASMA SOURCES; TIN;

CALCULATED SPECTRA; CONVERSION EFFICIENCY; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER-PRODUCED PLASMA;

LASER PRODUCED PLASMAS;

EID: 33646045041     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.032     Document Type: Article

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