Measurement of photostimulated self-diffusion in silicon

Journal of Applied Physics

Volumn 109, Issue 10, 2011, Pages

  Seebauer, Edmund G ^a   Jung, Michael Y L ^a   Kwok, Charlotte T M ^a   Vaidyanathan, Ramakrishnan ^a   Kondratenko, Yevgeniy V ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE STATE; DIFFUSION RATE; MODEL-BASED OPC; N-TYPE MATERIALS; OPTICAL FLUX; ROOM TEMPERATURE; SELF-DIFFUSION;

SEMICONDUCTOR DOPING;

DIFFUSION;

EID: 79958778731     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3590710     Document Type: Conference Paper

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