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Volumn 75, Issue 19, 2007, Pages

Mechanism and energetics of self-interstitial formation and diffusion in silicon

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EID: 34347341724     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.75.195209     Document Type: Article
Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.