Laser assisted focused-ion-beam-induced deposition of copper

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 179-180

  Funatsu, Jun ^a,b   Thompson, Carl V ^a   Melngailis, John ^a,c   Walpole, James N ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b TOYOTA MOTOR CORPORATION   (Japan)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ION BEAMS; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR LASERS; SILICON; THERMAL CONDUCTIVITY; THERMOCOUPLES;

FOCUSED ION BEAM INDUCED DEPOSITION; ION ENERGY; LASER POWER; TEMPERATURE RISE;

COPPER;

EID: 4243087116     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589023     Document Type: Article

References (8)

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