Fabrication of hole pattern for position-controlled MOVPE grown GaN nanorods with highly precise nanoimprint technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Eriksson, Torbjörn ^a   Lee, Ki Dong ^a   Heidari, Babak ^a   Rode, Patrick ^b   Bergbauer, Werner ^b   Mandl, Martin ^b   Kölper, Christopher ^b   Strassburg, Martin ^b  

^a Box 580   (Sweden)

^b OSRAM OPTO SEMICONDUCTORS GMBH   (Germany)

Author keywords

HBLED; High volume manufacturing; LED; Nano Imprint Lithography; Nanorod; Nanostructures; Nitrides; Sindre 400; Stamp lifetime; Yield

Indexed keywords

HBLED; HIGH VOLUME MANUFACTURING; LED; SINDRE 400; STAMP LIFETIME; YIELD;

DEFECTS; EPITAXIAL GROWTH; GALLIUM NITRIDE; LIGHT EMITTING DIODES; MANUFACTURE; NANOIMPRINT LITHOGRAPHY; NANORODS; ORGANOMETALLICS; SEMICONDUCTOR MATERIALS; SILICON WAFERS; SUBSTRATES; SURFACE DEFECTS; TECHNOLOGY;

POSITION CONTROL;

EID: 79955914926     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879368     Document Type: Conference Paper

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