High volume nanoimprint lithography on III/V substrates: Imprint fidelity and stamp lifetime

Microelectronic Engineering

Volumn 88, Issue 3, 2011, Pages 293-299

  Eriksson, Torbjörn ^a   Yamada, Shoko ^a   Venkatesh Krishnan, Prasanna ^a   Ramasamy, Sankar ^a   Heidari, Babak ^a  

^a Box 580   (Sweden)

Author keywords

HBLED; High volume manufacturing; LED; Nanoimprint lithography; NIL; Stamp lifetime; Yield

Indexed keywords

HBLED; HIGH VOLUME MANUFACTURING; LED; NANO-IMPRINT; NIL; STAMP LIFETIME; YIELD;

MANUFACTURE; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 78650736263     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.11.024     Document Type: Article

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