Revisit pattern collapse for 14nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Yoshimoto, Kenji ^a   Higgins, Craig ^a,b   Raghunathan, Ananthan ^b   Hartley, John G ^b   Goldfarb, Dario L ^c   Kato, Hirokazu ^d   Petrillo, Karen ^e   Colburn, Matthew E ^e   Schefske, Jeffrey ^a   Wood, Obert ^a   Wallow, Thomas I ^a  

^a IBM MICROELECTRONICS   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d Toshiba America Inc   (United States)

^e IBM   (United States)

Author keywords

Capillary force; E beam; EUV; Mechanical properties; Model; Pattern collapse; Rinse solution; Surface tension

Indexed keywords

CAPILLARY FORCE; E-BEAM; EUV; PATTERN COLLAPSE; RINSE SOLUTION;

MECHANICAL PROPERTIES; SURFACE ACTIVE AGENTS; SURFACE TENSION;

ASPECT RATIO;

EID: 79955882948     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.880180     Document Type: Conference Paper

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