Operation and performance of the CNSE Vistec VB300 electron beam lithography system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Hartley, J G ^a   Groves, T R ^a   Bonam, R ^a   Raghunathan, A ^a   Ruan, J ^a   McClelland, A ^b   Crosland, N ^b   Cunanan, J ^b   Han, K ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b Vistec Lithography Inc   (United States)

Author keywords

electron beam; electron beam lithography; lithography

Indexed keywords

193-NM IMMERSION; 300 MM WAFERS; ACCEPTANCE TESTS; BACKSIDE METAL; CLASS 1; EXTREME ULTRAVIOLETS; FRONT-OPENING UNIVERSAL PODS; GAUSSIANS; KEY COMPONENT; LOW LEVEL; METAL CONTAMINATION; MIX AND MATCH; NANO-IMPRINT; NANOSCALE SCIENCE AND ENGINEERING; NOVEL MATERIALS; OPTICAL PATTERNING; OPTICAL SCANNERS; PATTERNED WAFERS; POST-CMOS; PROCESS FLOWS; RESOLVING POWER; SMALL SAMPLES; STATE OF THE ART; SYSTEM SUPPORTS; TEMPLATE FABRICATION; TOTAL REFLECTION X-RAY FLUORESCENCE; WAFER SIZES; WORK IN PROGRESS;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; GAUSSIAN BEAMS; LASER RECORDING; METAL TESTING;

NANOIMPRINT LITHOGRAPHY;

EID: 77953315383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848396     Document Type: Conference Paper

References (6)

1. Harris, P.G., Lee, W., McClelland, A.M., Tingay, J.M. "Stage position measurement for e-beam lithography tool", Emerging Lithographic Techniques, Proc. of SPIE, Vol 6517, 651710, (2007)
2. Orloff, J., The Handbook of Charged Particle Optics, 1st ed. (CRC Press 1998), Chap. 1, pp. 32-47
3. "Vectorbeam Operator Manual", Vistec Internal document #893374
4. Jenkins, R., X-ray Fluorescence Spectrometry, Wiley, 1999
5. The Rigaku Journal Vol. 15. No.1, 1998, "TOTAL REFLECTION X-RAY SPECTROMETER TXRF 300".
6. Yang, J.K.W., and Berggren, K.K., Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography, J. Vac. Sci. Technol. B 25, 2025 (2007)