Atmospheric pressure plasma discharge for polysiloxane thin films deposition and comparison with low pressure process

Plasma Chemistry and Plasma Processing

Volumn 31, Issue 2, 2011, Pages 353-372

  Siliprandi, Riccardo A ^a   Zanini, Stefano ^a   Grimoldi, Elisa ^a   Fumagalli, Francesco S ^a   Barni, Ruggero ^a   Riccardi, Claudia ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

Dielectric barrier discharge; Hexamethyldisiloxane; Low pressure glow discharge; Plasma enhanced chemical vapour deposition; Polysiloxane

Indexed keywords

DIELECTRIC BARRIER DISCHARGES; HEXAMETHYLDISILOXANE; LOW PRESSURE GLOW DISCHARGE; PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION; POLYSILOXANES;

ANGLE MEASUREMENT; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DIAMOND FILMS; DIELECTRIC DEVICES; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILANES; SILICONES; THIN FILMS;

DEPOSITION;

EID: 79955820820     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-011-9286-3     Document Type: Article

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