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Volumn 54, Issue 2, 2009, Pages 165-172

AFM and contact angle investigation of growth and structure of pp-HMDSO thin films

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; CONTACT ANGLE; CRYSTAL ATOMIC STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICON WAFERS; SUBSTRATES;

EID: 68549088923     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2009-00117-6     Document Type: Article
Times cited : (26)

References (25)
  • 11
    • 85044486562 scopus 로고    scopus 로고
    • Coatings with low permeation of gases and vapors
    • European Patent EP1419286
    • G. Czeremuszkin, M. Latreche, M.R. Wertheimer, Coatings with low permeation of gases and vapors, European Patent EP1419286 (2004)
    • (2004)
    • Czeremuszkin, G.1    Latreche, M.2    Wertheimer, M.R.3
  • 24
    • 31444437531 scopus 로고    scopus 로고
    • X. Wang, G. Grundmeier, Plasma Process. Polym. 3, 39 (2006)
    • X. Wang, G. Grundmeier, Plasma Process. Polym. 3, 39 (2006)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.