Work function engineering in silicides: Chlorine doping in NiSi

Journal of Applied Physics

Volumn 109, Issue 8, 2011, Pages

  Slepko, Alexander ^a   Demkov, Alexander A ^a   Loh, W Y ^b   Majhi, P ^b   Bersuker, G ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CL-CONCENTRATIONS; IMPURITY SCATTERING; SCHOTTKY BARRIERS; SURFACE ENERGIES; THERMO DYNAMIC ANALYSIS;

CHLORINE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRONIC PROPERTIES; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; SURFACE CHEMISTRY; THERMOANALYSIS; WORK FUNCTION;

DENSITY FUNCTIONAL THEORY;

EID: 79955713337     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3573481     Document Type: Article

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