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Volumn 50, Issue 4 PART 2, 2011, Pages
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Erratum: Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor pH sensor using conventional complementary metal–oxide–semiconductor technology (Japanese Journal of Applied Physics (2011) 50 (04DL05) DOI: 10.1143/JJAP.50.04DL05);Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor ph sensor using conventional complementary metal-oxide-semiconductor technology
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
DIELECTRIC DEVICES;
FABRICATION;
FIELD EFFECT TRANSISTORS;
INTEGRATED CIRCUIT MANUFACTURE;
METALLIC COMPOUNDS;
METALS;
MOS DEVICES;
NANOWIRES;
OXIDE SEMICONDUCTORS;
PH EFFECTS;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON COMPOUNDS;
SYSTEM-ON-CHIP;
THRESHOLD VOLTAGE;
VLSI CIRCUITS;
COMPLEMENTARY METAL OXIDE SEMICONDUCTOR PROCESS;
COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGIES;
NANOWIRE FIELD EFFECT TRANSISTORS (NW FET);
POLYCRYSTALLINE SILICON (POLY-SI);
SELF ALIGNED FABRICATION;
SILICON NANOWIRE FIELD-EFFECT TRANSISTORS;
THRESHOLD VOLTAGE SHIFTS;
VERY-LARGE-SCALE INTEGRATION CIRCUITS;
PH SENSORS;
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EID: 79955417845
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.7567/JJAP.57.059202 Document Type: Erratum |
Times cited : (6)
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References (26)
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