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Volumn 50, Issue 4 PART 2, 2011, Pages

Erratum: Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor pH sensor using conventional complementary metal–oxide–semiconductor technology (Japanese Journal of Applied Physics (2011) 50 (04DL05) DOI: 10.1143/JJAP.50.04DL05);Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor ph sensor using conventional complementary metal-oxide-semiconductor technology

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC DEVICES; FABRICATION; FIELD EFFECT TRANSISTORS; INTEGRATED CIRCUIT MANUFACTURE; METALLIC COMPOUNDS; METALS; MOS DEVICES; NANOWIRES; OXIDE SEMICONDUCTORS; PH EFFECTS; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON COMPOUNDS; SYSTEM-ON-CHIP; THRESHOLD VOLTAGE; VLSI CIRCUITS;

EID: 79955417845     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.57.059202     Document Type: Erratum
Times cited : (6)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.