Theoretical ELNES spectra of Si-K, Si-L, N-K, and O-K edges of an intergranular glassy film model in β-Si3N4

Journal of Materials Science

Volumn 46, Issue 12, 2011, Pages 4191-4198

  Rulis, Paul ^a   Ching, W Y ^a  

^a UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; ATOMIC MODELS; ATOMIC SCALE IMAGING; BOND ANGLE; BONDED ATOM; BONDING ENVIRONMENT; COMPONENT ELEMENTS; COORDINATION NUMBER; ELECTRON ENERGY LOSS NEAR EDGE STRUCTURE; ENERGY RESOLUTIONS; INTERGRANULAR GLASSY FILMS; LOCAL COORDINATION; SPECTRAL MEASUREMENT; SPECTRAL RESPONSE;

ATOMS; ENERGY DISSIPATION; IMAGING TECHNIQUES; SILICON; TEXTURES;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 79953785794     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-011-5351-9     Document Type: Conference Paper

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