Ab initio tensile experiment on a model of an intergranular glassy film in Β -Si3 N4 with prismatic surfaces

Applied Physics Letters

Volumn 94, Issue 5, 2009, Pages

  Ching, W Y ^a   Rulis, Paul ^a   Ouyang, Lizhi ^b   Misra, A ^c  

^a UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

^b TENNESSEE STATE UNIVERSITY   (United States)

^c University of Kansas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC STRUCTURE; TEXTURES;

AB INITIO SIMULATIONS; AB-INITIO; BASAL PLANES; INTERGRANULAR GLASSY FILMS; STRESS-STRAIN BEHAVIORS; UNIAXIAL LOADS;

TENSILE STRENGTH;

EID: 59849120859     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3079800     Document Type: Article

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