New mechanisms for ozone-based ALD growth of high-k dielectrics via nitrogen-oxygen species

ECS Transactions

Volumn 33, Issue 2, 2010, Pages 91-99

  Jung, Sung Hoon ^a   Raisanen, Petri I ^a   Givens, Michael E ^a   Shero, Eric J ^a   Delabie, Annelies ^b   Swerts, Johan ^b   Van Elshocht, Sven ^b   Maes, Jan Willem ^c  

^a ASM AMERICA   (United States)

^b IMEC   (Belgium)

^c ASM BELGIUM   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FLOW OF GASES; GAS PERMEABLE MEMBRANES; GROWTH RATE; HAFNIUM OXIDES; HIGH-K DIELECTRIC; NITROGEN; OZONE;

ALD GROWTH; CROSS FLOWS; DIELECTRIC BARRIER DISCHARGES; FEED GAS FLOW; FTIR SPECTROMETRY; NEW MECHANISMS; OXYGEN SPECIES; THERMAL ALD;

ATOMIC LAYER DEPOSITION;

EID: 79952563313     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3485245     Document Type: Conference Paper

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