Etching of deep macropores in 6 in. Si wafers

Journal of the Electrochemical Society

Volumn 147, Issue 7, 2000, Pages 2757-2761

  Van Den Meerakker, J E A M ^a   Elfrink, R J G ^a   Roozeboom, F ^a   Verhoeven, J F C M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; HYDROFLUORIC ACID; PLATINUM; SILICON WAFERS; WATER;

PHOTOANODIC ETCHING;

ETCHING;

EID: 0034227004     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393602     Document Type: Article

References (7)

1. M. Theunissen, J. Electrochem. Soc., 119, 351 (1972).
2. V. Lehmann and H. Föll, J. Electrochem. Soc., 137, 653 (1990).
3. V. Lehmann, J. Electrochem. Soc., 140, 2836 (1993).
4. V. Lehmann, W. Hönlein, H. Reisinger, A. Spitzer, H. Wendt, and J. Willer, Thin Solid Films. 276, 138 (1996).
5. S. Cattarin and M. M. Musiani, J. Electrochem. Soc., 142, 3786 (1995).
6. S. Cattarin and L. M. Peter, J. Phys. Chem. B, 101, 3961 (1997).
7. M. J. Madou, B. H. Loo, K. W. Frese, and S. R. Morrison, Surf. Sci., 108, 135 (1981).