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Chemical Vapor Deposition

Volumn 17, Issue 1-3, 2011, Pages 9-14

Growth of few-layer graphene on a thin cobalt film on a Si/SiO2 substrate

(7) Kim, Eunho a An, Hyosub a Jang, Hyunchul a Cho, Won Ju b Lee, Naesung a Lee, Wan Gyu c Jung, Jongwan a

a Sejong University (South Korea)

b Kwangwoon University (South Korea)

c National Nano Fab Center (NNFC) (South Korea)

Author keywords

catalysts; chemical vapor deposition; cobalt; graphene; nickel

Indexed keywords

GRAPHENE LAYERS; NI FILMS; POLYCRYSTALLINE; PROCESS CONDITION; THIN COBALT FILMS; THINNER LAYERS;

CATALYSTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GRAPHENE;

COBALT;

EID: 79952741892 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.201004296 Document Type: Article

Times cited : (38)

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