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Volumn 8, Issue 3, 2011, Pages 991-995

Structures responsible for radiative and non-radiative recombination activity of dislocations in silicon

Author keywords

Dislocation network; Dislocation related uminescence; Dislocations; Photonics; Recombination; Silicon

Indexed keywords

BONDED SI WAFERS; BONDED WAFERS; COMMUNICATION COMPONENTS; DIRECT BONDING; DISLOCATION NETWORKS; DISLOCATION-RELATED UMINESCENCE; DISLOCATIONS; LIGHT EMITTING DEVICES; MINORITY CARRIER; MISALIGNMENT ANGLES; NON-RADIATIVE RECOMBINATIONS; ON CHIPS; OPTIMAL ALIGNMENTS; RADIATIVE RECOMBINATION; RECOMBINATION; SI WAFER;

EID: 79952649254     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000367     Document Type: Article
Times cited : (9)

References (23)
  • 17
    • 38549174084 scopus 로고    scopus 로고
    • The buried oxide layer (BOX) remaining at the interface after the hydrophilic bonding was dissolved by subsequent annealing in vacuum at high temperatures
    • O. Kononchuk, F. Boedt, and F. Allibert, Solid State Phenom. 131-133, 113 (2008). The buried oxide layer (BOX) remaining at the interface after the hydrophilic bonding was dissolved by subsequent annealing in vacuum at high temperatures.
    • (2008) Solid State Phenom , vol.131-133 , pp. 113
    • Kononchuk, O.1    Boedt, F.2    Allibert, F.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.