Effect of deposition temperature and quality of free-standing diamond substrates on the properties of RF sputtering ZnO films

Diamond and Related Materials

Volumn 20, Issue 4, 2011, Pages 527-531

  Chen, Liangxian ^a   Li, Chengming ^a   Yin, Weiling ^a   Liu, Jinlong ^a   Hei, Lifu ^a   Lu, Fanxiu ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

Deposition temperature; Free standing diamond films; RF magnetron; ZnO films

Indexed keywords

ACOUSTIC PHASE VELOCITY; DC ARC PLASMA JET; DEPOSITION TEMPERATURES; DIAMOND SUBSTRATES; FREE-STANDING DIAMOND FILMS; HIGH-FREQUENCY SURFACES; KEY FACTORS; PREFERRED ORIENTATIONS; RF MAGNETRON; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; SAW DEVICE; SEM; ZNO FILMS;

ACOUSTIC SURFACE WAVE DEVICES; ACOUSTIC WAVES; ACOUSTICS; DEPOSITION; DIAMOND DEPOSITS; DIAMONDS; MAGNETRON SPUTTERING; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

DIAMOND FILMS;

EID: 79952598438     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.02.006     Document Type: Article

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