Surface acoustic wave devices based on nanocrystalline diamond and aluminium nitride

Diamond and Related Materials

Volumn 13, Issue 2, 2004, Pages 347-353

  Benedic F ^a   Assouar, M B ^b   Mohasseb, F ^a   Elmazria, O ^b   Alnot, P ^b   Gicquel, A ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Aluminium nitride; High frequency electronics; Nanocrystalline diamond; Surface acoustic wave

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SILICON; SUBSTRATES;

SURFACE SMOOTHNESS;

DIAMONDS;

DIAMOND;

EID: 1542288009     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.020     Document Type: Article

References (20)

1. Shikata S.I. Dischler B. Wild C. Springer Series in Materials Processing. Low-Pressure Synthetic Diamond 1998 Springer Berlin
2. Nakahata H. Fujii S. Higaki K., et-al. Semicond. Sci. Technol. 18 2003 S96-S104
3. Mortet V. Elmazria O. Nesladek M., et-al. Appl. Phys. Lett. 81 2002 1720
4. Mortet V. Elmazria O. Nesladek M., et-al. Diamond Relat. Mater. 12 2003 723
5. D.M. Gruen, A.R. Krauss, US Patent Specification No. 5.772.760 (1998)
6. Gruen D.M. Ann. Rev. Mater. Sci. 29 1999 211
7. Bi B. Huang W.-S. Asmussen J. Golding B. Diamond Relat. Mater. 11 2002 677
8. K. Yamanouchi, N. Sakurai, T. Satoh, Proceedings of the IEEE Ultrasonics Symposium, 1989, pp. 351-354
9. Iriarte G.-F. J. Appl. Phys. 93 2003 9604
10. Park Y.S. Kim S.H. Lee J.-W. Jap. J. Appl. Phys. 33 1994 6320
11. Hassouni K. Grotjohn T.A. Gicquel A. J. Appl. Phys. 86 1999 134
12. Zhou D. McCauley T.G. Qin L.C. Krauss A.R. Gruen D.M. J. Appl. Phys. 83 1998 540
13. Zhou D. Gruen D.M. Qin L.C. McCauley T.G. Krauss A.R. J. Appl. Phys. 84 1998 1981
14. Jiao S. Sumant A. Kirk M.A. Gruen D.M. Krauss A.R. Auciello O. J. Appl. Phys. 90 2001 118
15. F. Mohasseb, G. Lombardi, F. Bénédic, K. Hassouni, F. Silva, A. Gicquel, in: P. Fauchais, J. Amouroux (Eds.), Progress in Plasma Processing of Materials, Begell House, New York, Wallingford, UK, Plasma Processes, chap. V, 2003, pp. 689-695, Proceedings of the 7th Thermal Plasma Processes Symposium, Strasbourg, France, 18-21 June 2002
16. Assouar M.B. Elmazria O. Le Brizoual L. Alnot P. Diamond Relat. Mater. 11 2002 413
17. van der Drift A. Philips Res. Rep. 22 1967 267
18. Nemanich R.J. Glass J.T. Lucovsky G. Schoder R.E. J. Vac. Sci. Technol. A 6 1988 1783
19. Ferrari A.C. Robertson J. Phys. Rev. B 63 2001 121405(R)
20. Nakahata H. Kitabayashi H. Uemura T., et-al. Jap. J. Appl. Phys. 37 1998 2918