Nanoparticle adhesion models: Applications in particulate contaminant removal from extreme ultraviolet lithography photomasks

Journal of Adhesion Science and Technology

Volumn 25, Issue 8, 2011, Pages 781-797

  Jaiswal, Ravi P ^a   Beaudoin, Stephen P ^a  

^a Purdue University   (United States)

Author keywords

adhesion; Effective van der Waals force; EUVL mask materials; nanoparticles

Indexed keywords

ADHESION FORCES; AFM PROBE; BAND DIAGRAMS; CONTAMINANT REMOVAL; CRITICAL ISSUES; EUVL MASK MATERIALS; EXPERIMENTAL STUDIES; EXTREME ULTRAVIOLET; FORCE CONSTANTS; HAMAKER CONSTANTS; MASK MATERIALS; MICROELECTRONICS MANUFACTURING; NANO SCALE; NANO-SIZED SILICON; NANOSCALE PARTICLES; NANOSCALE PARTICULATES; NITRIDE PARTICLES; PARTICLE ADHESION; PARTICLE GEOMETRIES; PHYSICAL PARAMETERS; SUBSTRATE SYSTEM; SURFACE DESCRIPTION; VAN DER WAALS;

ADHESION; CONTAMINATION; EXTREME ULTRAVIOLET LITHOGRAPHY; GEOMETRY; IMPURITIES; MICROELECTRONIC PROCESSING; MICROELECTRONICS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; PHOTOMASKS; SILICON NITRIDE; SURFACE MORPHOLOGY; SURFACE PROPERTIES; SURFACE ROUGHNESS; VAN DER WAALS FORCES;

SUBSTRATES;

EID: 79952121714     PISSN: 01694243     EISSN: 15685616     Source Type: Journal    
DOI: 10.1163/016942410X511123     Document Type: Article

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