Direct measurement of the effect of surface roughness on the colloidal forces between a particle and flat plate

Journal of Colloid and Interface Science

Volumn 196, Issue 2, 1997, Pages 177-190

  Suresh, Lakkapragada ^a,b   Walz, John Y ^a,c  

^a Tulane University   (United States)

^b Arizona State University   (United States)

^c Yale University   (United States)

Author keywords

Electrostatic forces; Surface forces; Surface roughness; Van der Waals forces

Indexed keywords

LATEX; POLYSTYRENE;

ARTICLE; ELECTRICITY; ENERGY; FORCE; IONIC STRENGTH; MOLECULAR INTERACTION; PARTICLE SIZE; PRIORITY JOURNAL; SEDIMENTATION RATE; SURFACE PROPERTY; TECHNIQUE;

EID: 0031573963     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1997.5216     Document Type: Article

References (29)

1. Derjaguin B. V., Landau L. Acta Physiochem. 14:1941;633.
2. E. G. W. Verwey, J. J. G. Overbeek, 1948, Theory of the Stability of Lyophobic Colloids, Elsevier, Amsterdam.
3. M. Elimelech, J. Gregory, X. Jia, R. Williams, 1995, Particle Deposition & Aggregation, 312, 314, Butterworth-Heinemann, Oxford.
4. Suresh L., Walz J. Y. J Colloid Interface Sci. 183:1996;199.
5. Ducker W. A., Senden T. J., Pashley R. M. Nature. 353:1991;239.
6. Toikka G., Hayes R. A., Ralston J. Langmuir. 12:1996;3783.
7. Hamaker H. C. Physica. 4:1937;1058.
8. Parsegian V. A., Weiss G. H. J Colloid Interface Sci. 81:1981;285.
9. Hough D. B., White L. R. Adv. Colloid Interface Sci. 14:1980;3.
10. Bell G. M., Levine S., McCartney L. N. J. Colloid Interface Sci. 33:1970;335.
11. Prieve D. C., Luo F., Lanni F. Faraday Discuss. Chem. Soc. 83:1987;22.
12. Bike S. G., Prieve D. C. Int. J. Multiphase Flow. 16:1990;727.
13. Prieve D. C., Frej N. A. Langmuir. 6:1990;396.
14. Walz J. Y., Suresh L. J. Chem. Phys. 103:1995;10714.
15. Brown M. A., Smith A. L., Staples E. J. Langmuir. 5:1989;1319.
16. Walz J. Y., Prieve D. C. Langmuir. 8:1992;3073.
17. Cox R. G., Brenner H. Chem. Eng. Sci. 22:1967;1753.
18. J. Y. Walz, 1992, Development of the Technique of Total Internal Reflection Microscopy and the Measurement of the van der Waals Interaction Energy, Carnegie-Mellon University, Pittsburgh.
19. Tabor D., Winterton R. H. S. Proc. R. Soc. London A. 312:1969;435.
20. Israelachvili J. N., Tabor D. Proc. R. Soc. London A. 331:1972;19.
21. Veeramusuneni S., Yalamanchili M. R., Miller J. D. J. Colloid Interface Sci. 184:1996;594.
22. W. B. Russel, D. A. Saville, W. R. Schowalter, 1995, Colloidal Dispersions, 118, Cambridge Univ. Press, Cambridge.
23. Sader J. E., Carnie S. L., Chan D. Y. C. J. Colloid Interface Sci. 171:1995;46.
24. J. Mahanty, B. W. Ninham, 1976, Dispersion Forces, 211, Academic Press, London.
25. Gregory J. J. Colloid Interface Sci. 83:1981;138.
26. J. Th. G. Overbeek, 1952, Colloid Science, 1, 266, Elsevier, Amsterdam.
27. Polverari M., van de Ven T. G. M. J Colloid Interface Sci. 173:1995;343.
28. Schumacher G. A., van de Ven T. G. M. Langmuir. 7:1991;2028.
29. Prieve D. C., Walz J. Y. Appl. Opt. 32:1993;1629.