메뉴 건너뛰기




Volumn 19, Issue 9, 2005, Pages 739-751

Principles and mechanisms of sub-micrometer particle removal by CO 2 cryogenic technique

Author keywords

BEOL cleaning; Cryogenic cleaning; FEOL cleaning; IC manufacturing; Particle removal efficiency

Indexed keywords

ADHESION; AEROSOLS; CRYOGENICS; DEFECTS; MAGNETIC RECORDING; SLURRIES;

EID: 25444460865     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/1568561054867828     Document Type: Article
Times cited : (20)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.