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Volumn 19, Issue 9, 2005, Pages 739-751
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Principles and mechanisms of sub-micrometer particle removal by CO 2 cryogenic technique
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Author keywords
BEOL cleaning; Cryogenic cleaning; FEOL cleaning; IC manufacturing; Particle removal efficiency
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Indexed keywords
ADHESION;
AEROSOLS;
CRYOGENICS;
DEFECTS;
MAGNETIC RECORDING;
SLURRIES;
BEOL CLEANING;
CRYOGENIC CLEANING;
FEOL CLEANING;
IC MANUFACTURING;
PARTICLE REMOVAL EFFICIENCY;
CARBON DIOXIDE;
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EID: 25444460865
PISSN: 01694243
EISSN: None
Source Type: Journal
DOI: 10.1163/1568561054867828 Document Type: Article |
Times cited : (20)
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References (16)
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