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Volumn 317, Issue 1, 2011, Pages 60-63
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Misorientation-angle dependence of boron incorporation into (0 0 1)-oriented chemical-vapor-deposited (CVD) diamond
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Author keywords
A1. CVD; A1. Doping; A1. p type; A3. Step flow growth; B1. Diamond; B2. Semiconductor
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Indexed keywords
A1. CVD;
A1. DOPING;
A1. P-TYPE;
B1. DIAMOND;
B2. SEMICONDUCTOR;
STEP-FLOW GROWTH;
BORON;
BORON COMPOUNDS;
DESORPTION;
DIAMOND FILMS;
DIAMONDS;
SEMICONDUCTOR GROWTH;
SOIL CONSERVATION;
CHEMICAL VAPOR DEPOSITION;
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EID: 79952040983
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2011.01.010 Document Type: Article |
Times cited : (33)
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References (14)
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