100 nm period grating by high-index phase-mask immersion lithography

Optics Express

Volumn 18, Issue 10, 2010, Pages 10557-10565

  Bourgin, Yannick ^a   Jourlin, Yves ^a   Parriaux, Olivier ^a   Talneau, Anne ^b   Tonchev, Svetlen ^a,c   Veillas, Colette ^a   Karvinen, Petri ^d   Passilly, Nicolas ^d   Md Zain, Ahmad R ^e   De La Rue, Richard M ^f   Van Erps, Jürgen ^g   Troadec, David ^h  

^a UNIVERSITÉ JEAN MONNET   (France)

^b UNIV PARIS SUD   (France)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^d UNIVERSITY OF EASTERN FINLAND   (Finland)

^e UNIVERSITY OF BRISTOL   (United Kingdom)

^f UNIVERSITY OF GLASGOW   (United Kingdom)

^g VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^h INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COLLIMATED BEAMS; HIGH INDEX; IMMERSION LITHOGRAPHY; INTERFEROGRAMS; NORMAL INCIDENCE; PHASE MASKS; RESIST FILMS; STITCHING ERRORS;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; NANOTECHNOLOGY; PHOTOGRAPHY; REFRACTOMETRY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; NANOTECHNOLOGY; PHOTOGRAPHY; REFRACTOMETRY;

EID: 77952688870     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.010557     Document Type: Article

References (23)

1. R. K. Heilmann, M. Ahn, E. M. Gullikson, and M. L. Schattenburg, "Blazed high-efficiency x-ray diffraction via transmission through arrays of nanometer-scale mirrors," Opt. Express 16(12), 8658-8669 (2008).
2. A. P. Rasmussen, A. Aquila, J. Bookbinder, C. Chang, E. Gullikson, R. K. Heilmann, S. M. Kahn, F. Paerels, and M. L. Schattenburg, "Grating arrays for high-throughput soft X-ray spectrometers", Proc. SPIE 5168, Optics for EUV, X-ray, and Gamma-ray Astronomy (SPIE, Bellingham, WA), eds. O. Citterio and S.L. O'Dell, 248-259 (2004).
3. M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone, "Resist trimming etch process control using dynamic scatterometry," Microelectron. Eng. 86(4-6), 1040-1042 (2009).
4. D. Mawet, P. Riaud, J. Surdej, and J. Baudrand, "Subwavelength surface-relief gratings for stellar coronagraphy," Appl. Opt. 44(34), 7313-7321 (2005).
5. T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tainamura, and S. Kawakami, "Photonic crystals for the visible range fabricated by autocloning technique and their application," Opt. Quantum Electron. 34(1/3), 63-70 (2002).
6. T. Moser, H. Glur, V. Romano, F. Pigeon, O. Parriaux, M. A. Ahmed, and T. Graf, "Polarization-selective grating mirror used in the generation of radial polarization" Applied Phys. B: lasers and optics 80, pp 707-713, (2005).
7. C. Pentico, E. Gardner, D. Hansen, R. Perkins, "New, high performance, durable polarizers for projection displays," SID 01 Digest, pp. 1287-1289 (2001)
8. C. Heine, and R. H. Morf, "Submicroineter gratings for solar energy applications," Appl. Opt. 34(14), 2476-2482 (1995).
9. A. Gombert, B. Bläsi, C. Bühler, P. Nitz, J. Mick, W. Hoßfeld, and M. Nlggemann, "Some application cases and related manufacturing techniques for optically functional microstructures on large areas," Opt. Eng. 43(11), 2525-2533 (2004).
10. http://www.itrs.net/ (March 2010)
11. G. C. Chen, P. T. Konkola, R. K. Heilmann, and M. L. Schattenburg, "Nanoinater-accurate grating fabrication with scanning beam interference lithography," Proc. SPIE 4936, 126-134 (2003).
12. C.-H. Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg, "Fabrication of 50 nm period gratings with multilevel interference lithography," Opt. Lett. 33(14), 1572-1574 (2008).
13. E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, "Flying phase mask for the printing of long subinicron-period stitchingless gratings," Microelectron. Eng. 83(4-9), 734-737 (2006).
14. E. Gamet, A. V. Tishchenko, and O. Parriaux, "Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating," Appl. Opt. 46(27), 6719-6726 (2007).
15. P. A. Zimmerman, C. Peski, B. Rice, J. Byers, N. J. Turro, X. Lei, J. L. Gejo, V. Liberinan, S. Palmacci, M. Rothchild, A. Whitker, I. Blakey, L. Chen, B. Dargaville, and H. Liu, "Status of High-Index Materials for Generation-Three 193nm Immersion Lithography," J. Photopolym. Sci. Technol. 20(5), 643-650 (2007).
16. K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu, K. Yamashita, T. Nishikawara, S. I. Hara, and Y. Watanabe, "Feasibility Study on Immersion System Using High-Index Materials," Jpn. J. Appl. Phys. 47(6), 4853-4861 (2008).
17. M. Daimon, and A. Masumura, "Measurement of the refractive index of distilled water from the near-infrared region to the ultraviolet region," Appl. Opt. 46(18), 3811-3820 (2007).
18. A. V. Tishchenko, "Phenomenological representation of deep and high contrast lamellar gratings by means of the modal method," Opt. Quantum. Electron. 37(1-3), 309-330 (2005).
19. E. Gamet, F. Pigeon, and O. Parriaux, "Duty cycle tolerant binary gratings for fabricable short period phase masks," J. Europ. Opt. Soc. Rap. Public. 4,09047 (2009).
20. N. Lyndin, "MC Grating Software Development Company," http://www.mcgrating.com/ (March 2010).
21. Y. Jourlin, Y. Bourgin, S. Reynaud, O. Parriaux, A. Talneau, P. Karvinen, N. Passilly, and A. Md, Zain, R. M. De La Rue, "DUV phase mask for 100 nm. period grating printing", Proc. SPIE 6992, (2008).
22. A. B. Djurišic, and E. H. Li, "Modeling the index of retraction of insulating solids with a modified lorentz oscillator model," Appl. Opt. 37(22), 5291-5297 (1998).
23. A. Talneau, F. Lemarchand, A. L. Fehrembach, and A. Sentenac, "Impact of electron-beam lithography irregularities across millimeter-scale resonant grating filter performances," Appl. Opt. 49(4), 658-662 (2010).