Growth mechanism of vertical compositional inhomogeneities in AlInN films

Journal of Physics D: Applied Physics

Volumn 44, Issue 7, 2011, Pages

  Zhang, S ^a   Liu, B ^b   Yin, J Y ^b   Sun, H H ^a   Feng, Z H ^b   Zhao, L C ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b HEBEI SEMICONDUCTOR RESEARCH INSTITUTE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FRACTIONS; GROWTH MECHANISMS; GROWTH STAGES; INHOMOGENEITIES; LATTICE-MATCHED; METALORGANIC CHEMICAL VAPOUR DEPOSITION; SECONDARY IONS; SELF-ASSEMBLED;

CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; X RAY DIFFRACTION;

DROP FORMATION;

EID: 79751470098     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/7/075405     Document Type: Article

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