Depth-resolved analysis of spontaneous phase separation in the growth of lattice-matched AlInN

Journal of Physics D: Applied Physics

Volumn 43, Issue 5, 2010, Pages

  Redondo Cubero, A ^a,b   Lorenz, K ^c   Gago, R ^d   Franco, N ^c   Di Forte Poisson, M A ^e   Alves, E ^c   Munoz E ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^d INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^e THALES RESEARCH AND TECHNOLOGY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL THICKNESS; DEPTH-RESOLVED ANALYSIS; HIGH RESOLUTION X RAY DIFFRACTION; LATTICE-MATCHED; LOW STRAINS; MOLAR FRACTIONS; NOMINAL COMPOSITION; PSEUDOMORPHIC GROWTH; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SINGLE CRYSTALLINE QUALITY; SINGLE-CRYSTALLINE; STRAIN RELAXATION MECHANISM;

CRYSTALLINE MATERIALS; FILM GROWTH; HETEROJUNCTIONS; PHASE MODULATION; PHOTODEGRADATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

PHASE SEPARATION;

EID: 76649083266     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/5/055406     Document Type: Article

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