SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B

Volumn 29, Issue 1, 2011, Pages

Nanostructured resistive memory cells based on 8-nm-thin TiO2 films deposited by atomic layer deposition

(5) Kugeler C a,b,c Zhang, J a,b Hoffmann Eifert, S a,b Kim, S K a,b Waser, R a,b

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b JARA Fundamentals of Future Information Technology (Germany)

c FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CRYSTAL ATOMIC STRUCTURE; ELECTROCHEMISTRY; ELECTROFORMING; ELECTROMETALLURGY; FILM PREPARATION; NANOIMPRINT LITHOGRAPHY; OXIDE MINERALS; SWITCHING; TITANIUM DIOXIDE;

HIGH CURRENT SWITCHING; HIGH-RESISTANCE STATE; IV CHARACTERISTICS; LATERAL DIMENSION; RESISTANCE SWITCHING BEHAVIORS; RESISTIVE SWITCHING; SILICON SUBSTRATES; SWITCHING CHARACTERISTICS;

PLATINUM COMPOUNDS;

EID: 79551645117 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3536487 Document Type: Conference Paper

Times cited : (18)

References (26)

1
- 0001331485
- 0003-6951, 10.1063/1.126902
- A. Beck, J. G. Bednorz, C. Gerber, C. Rossel, and D. Widmer, Appl. Phys. Lett. 0003-6951 77, 139 (2000). 10.1063/1.126902
- (2000) Appl. Phys. Lett. , vol.77 , pp. 139
- Beck, A.¹ Bednorz, J.G.² Gerber, C.³ Rossel, C.⁴ Widmer, D.⁵

2
- 67650102619
- 0935-9648, 10.1002/adma.200900375
- R. Waser, R. Dittmann, G. Staikov, and K. Szot, Adv. Mater. 0935-9648 21, 2632 (2009). 10.1002/adma.200900375
- (2009) Adv. Mater. , vol.21 , pp. 2632
- Waser, R.¹ Dittmann, R.² Staikov, G.³ Szot, K.⁴

3
- 33745013331
- 2
- DOI 10.1063/1.2210087
- D. C. Kim, Appl. Phys. Lett. 0003-6951 88, 232106 (2006). 10.1063/1.2210087 (Pubitemid 43877731)
- (2006) Applied Physics Letters , vol.88 , Issue.23 , pp. 232106
- Kim, D.C.¹ Lee, M.J.² Ahn, S.E.³ Seo, S.⁴ Park, J.C.⁵ Yoo, I.K.⁶ Baek, I.G.⁷ Kim, H.J.⁸ Yim, E.K.⁹ Lee, J.E.¹⁰ Park, S.O.¹¹ Kim, H.S.¹² Chung, U.-I.¹³ Moon, J.T.¹⁴ Ryu, B.I.¹⁵

4
- 50249156872
- Electron Devices Meeting, Washington, D.C., 10-12 December
- K. Tsunoda, K. Kinoshita, H. Noshiro, Y. Yamazaki, T. Iizuka, Y. Ito, A. Takahashi, A. Okano, Y. Sato, T. Fukano, M. Aoki, and Y. Suglyama, Electron Devices Meeting, Washington, D.C., 10-12 December 2007, pp. 767-770.
- (2007) , pp. 767-770
- Tsunoda, K.¹ Kinoshita, K.² Noshiro, H.³ Yamazaki, Y.⁴ Iizuka, T.⁵ Ito, Y.⁶ Takahashi, A.⁷ Okano, A.⁸ Sato, Y.⁹ Fukano, T.¹⁰ Aoki, M.¹¹ Suglyama, Y.¹²

5
- 73949083907
- 0040-6090, 10.1016/j.tsf.2009.10.040
- C. Kügeler, R. Weng, H. Schroeder, R. Symanczyk, P. Majewski, K. -D. Ufert, R. Waser, and M. Kund, Thin Solid Films 0040-6090 518, 2258 (2010). 10.1016/j.tsf.2009.10.040
- (2010) Thin Solid Films , vol.518 , pp. 2258
- Kügeler, C.¹ Weng, R.² Schroeder, H.³ Symanczyk, R.⁴ Majewski, P.⁵ Ufert, K.-D.⁶ Waser, R.⁷ Kund, M.⁸

6
- 48549095113
- C. Schindler, M. Meier, X. Guo, M. N. Kozicki, and R. Waser, Proceedings of the Non Volatile Memory Technology Symposium, 2007, pp. 82-85.
- (2007) Proceedings of the Non Volatile Memory Technology Symposium , pp. 82-85
- Schindler, C.¹ Meier, M.² Guo, X.³ Kozicki, M.N.⁴ Waser, R.⁵

7
- 33748997398
- A low-power nonvolatile switching element based on copper-tungsten oxide solid electrolyte
- DOI 10.1109/TNANO.2006.880407, 1695953
- M. N. Kozicki, C. Gopalan, M. Balakrishman, and M. Mitkova, IEEE Trans. Nanotechnol. 1536-125X 5, 535 (2006). 10.1109/TNANO.2006.880407 (Pubitemid 44444396)
- (2006) IEEE Transactions on Nanotechnology , vol.5 , Issue.5 , pp. 535-544
- Kozicki, M.N.¹ Gopalan, C.² Balakrishnan, M.³ Mitkova, M.⁴

8
- 60749127336
- 0003-6951, 10.1063/1.3077310
- C. Schindler, G. Staikov, and R. Waser, Appl. Phys. Lett. 0003-6951 94, 072109 (2009). 10.1063/1.3077310
- (2009) Appl. Phys. Lett. , vol.94 , pp. 072109
- Schindler, C.¹ Staikov, G.² Waser, R.³

9
- 33748880986
- Introduction to terahertz pulses
- DOI 10.1007/10828028-1, Terahertz Optoelectronics
- D. K. Sarkar, F. Cloutier, and M. A. El Hkakani, J. Appl. Phys. 0021-8979 97, 1 (2005). 10.1007/10828028-1 (Pubitemid 44418322)
- (2005) Topics in Applied Physics , vol.97 , pp. 1-30
- Sakai, K.¹ Tani, M.²

10
- 33645641019
- 1476-1122, 10.1038/nmat1614
- K. Szot, W. Speier, G. Bihlmayer, and R. Waser, Nature Mater. 1476-1122 5, 312 (2006). 10.1038/nmat1614
- (2006) Nature Mater. , vol.5 , pp. 312
- Szot, K.¹ Speier, W.² Bihlmayer, G.³ Waser, R.⁴

11
- 79551646810
- 0003-6951.
- D. S. Jeong, H. Schroeder, and R. Waser, Appl. Phys. Lett. 0003-6951 89, 1 (2006).
- (2006) Appl. Phys. Lett. , vol.89 , pp. 1
- Jeong, D.S.¹ Schroeder, H.² Waser, R.³

12
- 18744373862
- CMOL FPGA: A reconfigurable architecture for hybrid digital circuits with two-terminal nanodevices
- DOI 10.1088/0957-4484/16/6/045, PII S0957448405943274
- D. Strukov and K. Likharev, Nanotechnology 0957-4484 16, 888 (2005). 10.1088/0957-4484/16/6/045 (Pubitemid 40666599)
- (2005) Nanotechnology , vol.16 , Issue.6 , pp. 888-900
- Strukov, D.B.¹ Likharev, K.K.²

13
- 33846807711
- 0957-4484.
- G. S. Snider and R. S. Williams, Nanotechnology 0957-4484 18, 1 (2007).
- (2007) Nanotechnology , vol.18 , pp. 1
- Snider, G.S.¹ Williams, R.S.²

14
- 33846491447
- 11 bits per square centimetre
- DOI 10.1038/nature05462, PII NATURE05462
- J. E. Green, J. W. Choi, A. Boukai, Y. Bunimovich, E. Johnston-Halperin, E. Delonno, Y. Luo, B. A. Sheriff, K. Xu, Y. S. Shin, H-R. Tseng, J. F. Stoddart, and J. R. Heath, Nature 0028-0836 445, 414 (2007). 10.1038/nature05462 (Pubitemid 46160906)
- (2007) Nature , vol.445 , Issue.7126 , pp. 414-417
- Green, J.E.¹ Wook Choi, J.² Boukai, A.³ Bunimovich, Y.⁴ Johnston-Halperin, E.⁵ Deionno, E.⁶ Luo, Y.⁷ Sheriff, B.A.⁸ Xu, K.⁹ Shik Shin, Y.¹⁰ Tseng, H.-R.¹¹ Stoddart, J.F.¹² Heath, J.R.¹³

15
- 71649092208
- 0038-1101, 10.1016/j.sse.2009.09.034
- C. Kügeler, M. Meier, R. Rosezin, S. Gilles, and R. Waser, Solid-State Electron. 0038-1101 53, 1287 (2009). 10.1016/j.sse.2009.09.034
- (2009) Solid-State Electron. , vol.53 , pp. 1287
- Kügeler, C.¹ Meier, M.² Rosezin, R.³ Gilles, S.⁴ Waser, R.⁵

16
- 77951622926
- 1476-1122, 10.1038/nmat2748
- E. Linn, R. Rosezin, C. Kügeler, and R. Waser, Nature Mater. 1476-1122 9, 403 (2010). 10.1038/nmat2748
- (2010) Nature Mater. , vol.9 , pp. 403
- Linn, E.¹ Rosezin, R.² Kügeler, C.³ Waser, R.⁴

17
- 44149128690
- 0167-9317, 10.1016/j.mee.2008.01.101
- M. Meier, C. Nauenheim, S. Gilles, D. Mayer, C. Kügeler, and R. Waser, Microelectron. Eng. 0167-9317 85, 870 (2008). 10.1016/j.mee.2008.01.101
- (2008) Microelectron. Eng. , vol.85 , pp. 870
- Meier, M.¹ Nauenheim, C.² Gilles, S.³ Mayer, D.⁴ Kügeler, C.⁵ Waser, R.⁶

18
- 79551630373
- 0013-4651, 10.1149/1.3507258
- S. K. Kim, S. Hoffmann-Eifert, M. Reiners, and R. Waser, J. Electrochem. Soc. 0013-4651 158, D6 (2011). 10.1149/1.3507258
- (2011) J. Electrochem. Soc. , vol.158 , pp. 6
- Kim, S.K.¹ Hoffmann-Eifert, S.² Reiners, M.³ Waser, R.⁴

19
- 67650653809
- C. Nauenheim, C. Kügeler, St. Trellenkamp, A. Rüdiger, and R. Waser, Proceedings of the 10th International Conference on Ultimate Integration on Silicon, 18-20 March 2009, Aachen, pp. 135-138.
- (2009) Proceedings of the 10th International Conference on Ultimate Integration on Silicon, 18-20 March, Aachen , pp. 135-138
- Nauenheim, C.¹ Kügeler, C.² Trellenkamp, St.³ Rüdiger, A.⁴ Waser, R.⁵

20
- 69949180728
- 0920-2307, 10.1016/S0920-2307(89)80006-4
- T. Suntola, Mater. Sci. Rep. 0920-2307 4, 261 (1989). 10.1016/S0920-2307(89)80006-4
- (1989) Mater. Sci. Rep. , vol.4 , pp. 261
- Suntola, T.¹

21
- 0344667722
- Atomic layer deposition chemistry: Recent developments and future challenges
- DOI 10.1002/anie.200301652
- M. Leskelä, Intern. Angew. Chem. Int. Ed. 42, 5548 (2003). 10.1002/anie.200301652 (Pubitemid 37509356)
- (2003) Angewandte Chemie - International Edition , vol.42 , Issue.45 , pp. 5548-5554
- Leskela, M.¹ Ritala, M.²

22
- 21744444606
- Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
- DOI 10.1063/1.1940727, 121301
- R. L. Puurunen, J. Appl. Phys. 0021-8979 97, 121301 (2005). 10.1063/1.1940727 (Pubitemid 40940570)
- (2005) Journal of Applied Physics , vol.97 , Issue.12 , pp. 1-52
- Puurunen, R.L.¹

23
- 28044464256
- 2 thin films on a Ru electrode in three-dimensional contact holes using atomic layer deposition
- DOI 10.1149/1.2081994
- S. K. Kim, K. -M. Kim, O. S. Kwon, S. W. Lee, C. B. Jeon, W. Y. Park, C. S. Hwang, and J. Jeong, Electrochem. Solid-State Lett. 1099-0062 8, F59 (2005). 10.1149/1.2081994 (Pubitemid 41692355)
- (2005) Electrochemical and Solid-State Letters , vol.8 , Issue.12
- Kim, S.K.¹ Kim, K.-M.² Kwon, O.S.³ Lee, S.W.⁴ Jeon, C.B.⁵ Park, W.Y.⁶ Hwang, C.S.⁷ Jeong, J.⁸

24
- 67650627653
- 0013-4651, 10.1149/1.3138722
- S. K. Kim, S. Hoffmann-Eifert, S. Mi, and R. Waser, J. Electrochem. Soc. 0013-4651 156, D296 (2009). 10.1149/1.3138722
- (2009) J. Electrochem. Soc. , vol.156 , pp. 296
- Kim, S.K.¹ Hoffmann-Eifert, S.² Mi, S.³ Waser, R.⁴

25
- 84905955181
- (unpublished).
- S. K. Kim, S. Hoffmann-Eifert, and R. Waser (unpublished).
- Kim, S.K.¹ Hoffmann-Eifert, S.² Waser, R.³

26
- 77950364821
- 0003-6951, 10.1063/1.3367752
- C. Nauenheim, C. Kügeler, A. Ruediger, and R. Waser, Appl. Phys. Lett. 0003-6951 96, 122902 (2010). 10.1063/1.3367752
- (2010) Appl. Phys. Lett. , vol.96 , pp. 122902
- Nauenheim, C.¹ Kügeler, C.² Ruediger, A.³ Waser, R.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.