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Japanese Journal of Applied Physics

Volumn 49, Issue 11, 2010, Pages

Thin film solar cells prepared on low thermal budget polycrystalline silicon seed layers

(6) Jaeger, Christian a Matsui, Takuya b Takeuchi, Masayoshi b Karasawa, Minoru b Kondo, Michio b Stutzmann, Martin a

a WALTER SCHOTTKY INSTITUT (Germany)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER LAYERS; ALUMINUM-INDUCED LAYER EXCHANGE; BACK CONTACT; CELL PREPARATION; CHEMICAL VAPOUR DEPOSITION; EPITAXIAL OVERGROWTH; LOW THERMAL BUDGET; PLASMA TREATMENT; POLY-CRYSTALLINE SILICON; SEED LAYER; SOLAR CELL EFFICIENCIES; SOLAR CELL PERFORMANCE; THIN FILM SOLAR CELLS; TOP SURFACE; WET-CHEMICAL METHOD;

EPITAXIAL GROWTH; FILM PREPARATION; HYDROFLUORIC ACID; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; TIN; TIN OXIDES;

SOLAR CELLS;

EID: 79551616362 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.112301 Document Type: Article

Times cited : (12)

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