Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Applied Surface Science

Volumn 257, Issue 10, 2011, Pages 4738-4742

  Guo, Guangwei ^a,b   Tang, Guangze ^a   Wang, Yajun ^a   Ma, Xinxin ^a   Sun, Mingren ^a   Wang, Liqin ^a   Yukimura, Ken ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b NORTHEAST PETROLEUM UNIVERSITY   (China)

Author keywords

a C:H films; Elastic modulus; Hardness; MF PCVD; Structure

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; BIAS VOLTAGE; CARBON FILMS; ELASTIC MODULI; HARDNESS; MIXTURES; PLASMA CVD; STRUCTURE (COMPOSITION);

A-C:H FILMS; HARDNESS AND ELASTIC MODULUS; HYDROCARBON SOURCES; INTENSITY RATIO; MF-PCVD; PLASMA CHEMICAL VAPOR DEPOSITION; SILICON SUBSTRATES; VOLTAGE AMPLITUDE;

FILM PREPARATION;

EID: 79551561777     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.12.150     Document Type: Article

References (25)

1. J. Robertson Materials Science and Engineering 37 2002 129
2. J.X. Liao, W.M. Liu, and T. Xu Carbon 42 2004 387
3. Andrzej Czyzniewski Surface & Coatings Technology 203 2009 1027
4. K.W. Weng, S. Han, and Y. Chen Journal of Materials Processing Technology 203 2008 117
5. Jaanus Eskusson, Raivo Jaaniso, and Enn Lust Applied Surface Science 255 2009 7104
6. M. Smietana, J. Szmidt, M.L. Korwin-Pawlowski, N. Miller, and A.A. Elmustafa Diamond and Related Materials 17 2008 1655
7. C. Corbella, M. Rubio-Roy, and E. Bertran Journal of Applied Physics 106 2009 033302
8. W.S. Choi, I. Chung, and Y.Z. Lee Surface and Coatings Technology 180-181 2004 254
9. S. Peter, M. Günther, D. Hauschild, D. Grambole, and F. Richler Vacuum 84 2010 958
10. C. Casiraghi, A.C. Ferrari, and J. Robertson Physical Review B 72 2005 085401
11. T. Schwarz-Selinger, A. con Keudell, and W. Jacob Journal of Applied Physics 86 1999 3988
12. X. Li, and B. Bhushan Materials Characterization 48 2002 11
13. A. von Keudell, and W. Jacob Journal of Applied Physics 81 1997 1531
14. C. Hopf, W. Jacob, and A. von Keudell Journal of Applied Physics 97 2005 094904
15. S. Peter, K. Graupner, D. Grambole, and F. Richter Journal of Applied Physics 102 2007 053304
16. J.E. Dahl, S.G. Liu, and R.M.K. Carlson Science 299 2003 96
17. B. Marchon, J. Gui, and K. Grannen IEEE Transactions on Magnetics 33 1997 3148
18. J.G. Buijnsters, R. Gago, I. Jiménez, M. Camero, F. Agolló-Rueda, and C. Gómez-Aleixandre Journal of Applied Physics 105 2009 093510
19. J.C. Sánchez-López, C. Donnet, J.L. Loubet, M. Belin, A. Grill, V. Patel, and C. Jahnes Diamond and Related Materials 10 2001 1063
20. J. Filik, J.N. Harvey, N.L. Allan, P.W. May, J.E.P. Dahl, S. Liu, and R.M.K. Carlson Physics Review B 74 2006 035423
21. A.P. Marchand Science 299 2003 52
22. J. Filik, J.N. Harvey, N.L. Allan, P.W. May, J.E.P. Dahl, S. Liu, and R.M.K. Carlson Spectrochimica Acta Part A 64 2006 681
23. A.C. Ferrari, and J. Robertson Physical Review B 6 20 2000 14097
24. X.X. Ma, G.Z. Tang, and M.R. Sun Surface & Coatings Technology 201 2007 7641
25. J.G. Buijnsters, M. Camero, L. Vázquez, F. Agulló-Rueda, R. Gago, and I. Jiménez Diamond & Related Materials 19 2010 1093